Performance of RF plasma flood gun for medium current implanter

We have developed a new PFG apparatus using a RF discharge. In this paper, we show the performance of the PFG under the typical implantation condition in medium ion implanter. The measured charging characteristics with CHARM2™ and MOS capacitor TEG surpass those of the conventional PFG with filament. Also the present PFG doesn't degrade other implantation qualities such as dose uniformity, dose shift and metal contamination. In addition, the absence of filament can reduce the maintenance time. The aimed running time is more than 2,000 hours.