Shadowgraphic studies of DLC film deposition process in dense plasma focus device

Summary form only given, as follows. The 3.3 kJ dense plasma focus (DPF) device is used to deposit diamond-like carbon (DLC) thin films on corning and silicon substrates by ablating the high purity graphite anode. For deposition of DLC thin films, the conventional central hollow copper anode is fitted with a solid graphite top, which is 3 cm long.