Generation of enhanced pulsed electron beams by a pulse charge mode multi-gap pseudospark for material processing

Summary form only given, as follows. An intense pulsed electron beam produced by a pseudospark discharge has been used for material processing. Such intense electron beams can be produced with high efficiency by a pulse charge mode pseudospark discharge. In this work, we experimentally investigated a pulse charge mode to generate enhanced pulsed electron beam from a 10-gap pseudospark device.