Design and performance of a 120 kV, 40 kW plasma ion implantation facility

Summary form only given, as follows. Design of a Plasma Immersion Ion Implantation and Deposition Facility is described and its performance at various operational conditions is discussed. The facility has horizontally mounted cylindrical processing chamber. Two sputter magnetrons can be mounted onto rectangular flanges placed along the chamber symmetrically to its axis for deposition.