Fabrication of diamond mold for imprint lithography

The authors propose the fabrication method for a diamond mold for imprint lithography to transfer the dot pattern onto recording media. It is expected that more high density and small dot patterns will be imprinted using the diamond mold. A diamond thin film with a thickness of about 10 /spl mu/m was deposited on a Si wafer using hot-filament chemical vapor deposition (HF-CVD). The wafer with the diamond film was anodically bonded with 5 mm thick Pyrex glass via sputtered Al film as an adhesive layer. An aligned hole pattern can be successfully transferred on the diamond film by oxygen fast atom beam etching.