A deep X-ray lithography in the "NewSUBARU"

A beam line BL11 is constructed for exposure Hard X-ray Lithography (DXL) in the LIGA. LIGA process, that utilizes a useful industrial application of SR, is one of the promising technologies for fabrication of extremely tall three-dimensional microstructures with a large aspect ratio. Microstructures with height of over a few hundreds /spl mu/m have been widely applied to various fields such as micro-mechanics, micro-optics, sensor and actuator technology, chemical, medical and biological engineering, and so on. This beam line was designed by the criteria; photon energy range 2 keV to 6 keV, a beam spot size on the exposure stage /spl ges/50/spl times/5 min/sup 2/, a density of total irradiated photons /spl ges/10/sup 11/ photons/cm/sup 2/.