Development of Microfabrication Platform and Process Design Kit for Thin-Film Lithium Niobate Photonic Integrated Circuits

Thin-film lithium niobate (TFLN) has emerged as a key platform for high-performance photonic integrated circuits (PICs) due to its superior electro-optic, nonlinear, and broadband transparency characteristics^1,2. However, currently there is no facility in Canada that can provide an integrated process design kit (PDK) and foundry services for such platform. INO is currently developing a comprehensive PDK for TFLN PICs on 150 mm and 200 mm wafers. The PDK leverages state-of-the-art fabrication processes at INO and aims to streamline the design cycle for commercial and research-focused photonic device development.