Cluster Ion Beams: Implantation, Sputtering and More

Ion beams have many applications and one of the most successful applications of ion beams is doping technique in semiconductors. The use of ion implantation has expanded from channel doping to shallow junction formation and deep well doping. As the field of applications has expanded, semiconductor implanters have become more precise and capable of handling higher currents and a wider range of implantation species. As compared to other semiconductor manufacturing equipment, the first characteristic of the ion implanter is its size and high throughput. Ion energy, dosage, and ion species are controlled with extremely high precision, and ion implantation is one of the extremely reproducible process technologies in semiconductor manufacturing fabrication.