WCVD Chamber Parts Material Selection To Prolong Wetclean Counter

Tungsten chemical vapor deposition (WCVD) Remote Plasma Clean (RPC) chamber preventive maintenance (PM) wafer counts restricted by wafer transferring and particles performance. Material selection is crucial to minimize byproduct formation and maintain chamber efficiency. This study evaluates the performance of stainless steel, nickel (Ni), and aluminum (Al) components within the chamber. Stainless steel spring washers lead to iron fluoride and chromium fluoride formation, causing rubbing and vibration that results in mechanical issues. In contrast, nickel washers show reduced byproduct formation under normal conditions, though nickel fluoride (NiF2) was form at elevated temperatures. Aluminum components, protected by a stable oxide layer, remain inert, preventing AlF3 formation and maintaining chamber cleanliness. Further analysis suggests aluminum screws significantly decrease contamination, enhancing process quality and reducing maintenance needs. The transition to nickel washers and aluminum screws optimizes chamber performance, extending operational efficiency and reducing costs.