Development of Sugar-Derived Water-Soluble Photoresist Materials with Potential for Environmental Impact Reduction and Biomaterial Applications

Conventional photoresist materials are generally coated and developed using organic solvents, but the water-soluble photoresist material in this study can be coated and developed using water. Patterning of water-soluble photoresist material on PMMA, which was contaminated or damaged by the organic coating solvent and developer in the conventional photoresist material, resulted in the fabrication of 6 µm holes and 3 µm lines. The water-based coating and development process is expected to contribute to biomaterial applications and environmental impact.