Theoretical Research on the Fabrication of Large-Area Diamond Substrates Using Carbon Material Phase Transition Technology on Silicon Substrates

This study explores a novel method for fabricating large-area diamond substrates by utilizing the phase transition properties of carbon materials on silicon substrates. Using high-temperature chemical vapor deposition (CVD), a uniform pyrolytic graphite coating is deposited on a silicon wafer. Under appropriate conditions, this coating can exhibit a multilayer graphene structure. Some techniques enable the transformation of graphite into diamond, suggesting the feasibility of directly converting the multilayer graphene coating into a diamond substrate. By subsequently heating and physically removing the silicon substrate, a large-area diamond substrate can be obtained. This method presents a promising approach to overcome current limitations in diamond substrate fabrication, offering significant potential for applications in electronics and optics.