An Optimized Iterative Method for Generating Hologram Mask of Large Space-bandwidth-product

The algorithm for hologram mask design plays a crucial role in determining the final quality of the reconstructed pattern in diffraction lithography or its feasibility for fabricating large-scale integrated circuits. This paper presents an approach for generating hologram masks of large space-bandwidth products (SBP), effectively reducing the computation complexity and memory requirements without necessitating additional computer power. By leveraging the GS algorithm and incorporating area division and an overlapping constraint, this method facilitates the generation of masks of large SBP, which is beneficial for use in diffraction lithography. Moreover, it can be optimized for parallel operations to reduce computation time significantly, enabling efficient generalization of diffraction masks of large SBP.