The design of transparent capacitance for displays

The transparent capacitance structure has been proposed and introduced to fabricate active-matrix organic light-emitting diode (AMOLED) displays with large size and high resolution. The effect of different impedances of capacitance on the display uniformity has been studied through simulation analysis. In the pixel design, optical and electrical simulations were conducted using ITO transparent capacitors with different thicknesses. The optical simulation results indicate that the transparency of ITO can be significantly improved when the thickness of the transparent capacitor is less than 20nm. The ITO layer can be located on either the gate or source terminal of T1. When the ITO layer is located at the gate terminal of T1, it can reduce the influence of feedthrough on the display uniformity. When ITO is located at the source side of T1, it can elevate the voltage at the T1 source point, resulting in the reduced panel uniformity. Finally, this pixel circuit is placed in a 15-inch AMOLED display to testify the function.