Effect of High-Frequency Short-Pulses Biasing on Macroparticle in Plasma Ion Implantation Systems

The theoretical model of the interaction of macroparticle (MP) with vacuum arc plasma in plasma immersion ion implantation (PIII) is developed, taking into account the temporal evolution of the MP charge. The proposed model is based on a combination of Lieberman’s model for the implantation sheath and the theory of MP charge dynamics. In the framework of this model, the MP charge evolution is investigated during high-frequency short pulses (with a duration of
$\leq$
10
$\rm \mu s$
), as well as during the time intervals between these pulses. It is shown that an MP can keep the negative charge in the pulsed sheath for a much longer period compared with the steady sheath.