New method for monolithic gap head

A novel monolithic gap (MG) head is proposed and its fabrication process is described for a VCR where the track width and the gap length cannot be determined in a mechanical manner but rather by applying such method as sputtering and photolithography. These methods were applied to a head process with a 50-mm/sup 2/ wafer, and the practical applicability of the process was confirmed. The performance of the head was also examined under the 8-mm video specifications, and it was confirmed that the output level and the frequency response were as good as those of the conventional bonding-type head.<>