Unipolar arcs in high frequency field

In the present paper we describe experimental investigations of the unipolar arcs in the plasma device designed for thin film deposition. Unipolar arcs were generated in a vacuum arc in which the high-frequency power is injected into the plasma. For the arc characteristic measurements, the coaxial floating arc probe of special design was used and the arc tracks on the polished metal were studied. The arcing rate in the high frequency plasma discharge was found to have an abrupt cutoff with a frequency approaching 10/sup 7/ Hz. The similar dependency was received for the spattered mass.