10nm Particle Deposition Capability for Qualification of Next-Generation Defect Inspection Tools

Depositions of 10nm silica nanoparticles produced with a sol-gel synthesis process were made on bare silicon wafers with a particle deposition system (PDS) controlling particle modal diameter within ±0.5nm and areal number density within ±50%. Deposited particle size distributions and areal number density were successfully characterized with atomic force microscope (AFM) and scanning electron microscope (SEM) instruments. Issues encountered with electrostatic deposition of nanoparticles on TEM grids secured to wafer surfaces are discussed.