Grain-Size Enlargement of MoS2 Film by Low-Rate Sputtering with Molybdenum Grid

Low-rate sputtering with a molybdenum grid reduced the deposition rate of
$\text{MoS}_{2}$
films, enlarging a grain size measured by in-plane X-ray diffraction. The
$\text{MoS}_{2}$
film crystallinity evaluated by the Raman spectroscopy was improved because the S/Mo ratio was also enhanced by the low-rate sputtering. They contributed to a better-quality of
$\text{MoS}_{2}$
film for pn-stacked 2D-CMOS devices.