Design and implementation of an adaptive controller for electron beam evaporation system

In this paper, design and implementation of a high accuracy alloy evaporation system is reported. The thermodynamics, modeling, identification and controller designs of the system are discussed. All the necessary hardware and software have been made and tested. The performance and accuracy of the system have been verified using RBS (Rutherford backscattering) and PIXE (particle induced X-ray emission) (Sze, 1989) of deposited films (Ahadi and Rashidian, 1999). There is no theoretical limitation for the number of elements in the alloy in the method presented here; however, the system reported here has been implemented for use of up to 6 different materials for formation of the desired alloy.