Methane sensing properties of CuxO thin films deposited by pulsed laser deposition

In the present work, undoped Cu
_x
O thin films were deposited by pulsed laser deposition on glass and SiO
₂
substrates, at a constant oxygen partial pressure of 40Pa and at constant temperature of 200°C. The surface morphology of the deposited thin films was investigated by atomic force microscopy (AFM) in contact mode. The paper shows the 3D AFM images of Cu
_x
O thin films deposited on glass and SiO
₂
substrate, respectively. We noted that the substrate type had an effect on the surface morphology of the films; the one on glass substrate was smoother than the other on SiO
₂
substrate with an average roughness around 6nm for a scanning area of 2¿mx2¿m.