Latest results from the hyper - NA immersion scanners

Intensive immersion scanner development has enabled resolution of the main technical challenges that had been considered potential show-stoppers for immersion lithography. Leading-edge immersion scanners, such as the Nikon NSR-S610C, deliver not only the 1.30 numerical aperture required for 45 nm half-pitch production, but also provide overlay accuracy, defectivity comparable to dry exposure tools.