Development of a high efficiency PFC abatement system utilizing plasma and Ca(OH)2/CaO under a decompression atmosphere

We have developed a PFC abatement system utilizing a 2 MHz ICP plasma source and two columns filled with Ca(OH)
₂
/CaO under a decompression atmosphere without fluorine acid drainage treatment. The 2 MHz ICP plasma decomposes the PFCs. The Ca(OH)
₂
/CaO columns immobilize the reactive fluorinated compounds. When we treated the emissions from a Si oxidation film etching process chamber by using this abatement system, F
₂
equivalent removal efficiency and CO
₂
equivalent removal efficiency were 99.64% and 90.59%, respectively. The discrepancy between the two efficiencies can be attributed to the fact that 98% of CO
₂
equivalent emissions were caused by power consumption.