Room-temperature operation of patterned quantum-dot lasers fabricated by electron beam lithography and selective area metal-organic chemical vapor deposition

We have developed a quantum-dot fabrication process which allows for explicit definition of the location and lateral dimension of quantum dots using electron beam lithography and selective area metal-organic chemical vapor deposition. We have demonstrated the first reported room-temperature operation of a patterned quantum-dot edge-emitting laser based on this fabrication technique.