Molding of high aspect ratio ferroelectric microstructures

Fabrication of high aspect ratio structures of complex perovskite materials using photoresist templates is reported in this work. Water based (Pb,Ba)TiO/sub 3/ (PBT) and 2-methoxyethanol based PbZr/sub 0.52/Ti/sub 0.48/O/sub 3/ (PZT) sol-gel precursor solutions were used to infiltrate prefabricated photoresist templates on various substrates. The solutions were deposited by vacuum infiltration assisted dip coating. Pyrolysis and the crystallization of the pillars were performed after removal of the gel layer formed on the surface of the mold. During crystallization process of photoresist was removed simultaneously. Various aspect ratio PZT and PBT structures were obtained.