Research on the Influence of Sector Angle and Flow Rate on Each Reactant Gas in MOCVD Reactor

The high-temperature MOCVD growth of aluminum nitride films aggravate the gas phase parasitic reaction due to the pre-mixing of reactive gases. In order to weaken the gas phase parasitic reaction, a multi-sector spray structure in MOCVD reactor is proposed. The spray structure is composed of multiple sectors. Each reaction gas is passed into a different sector channel by a carrier gas. The channels of the reaction gas are separated by isolated gas channels. By establishing a three-dimensional model of the reactor structure and a flow field model, the effects of the size of each spray sector and the flow rate of the isolated gas on the flow field distribution under high temperature conditions are studied. It was found that when the angle of each reaction gas sector and the isolated gas flow rate are increased to a certain value, the isolated gas channel has a better isolation effect on the reaction gas, which can significantly reduce the premixing of each reaction gas, weak the parasitic reaction. And contribute to improving the quality of the grown film.