Patterning Perovskite Thin Film via CYTOP Assisted Photolithography Process

In this study, perovskite patterning is realized by solution-processed with the help of perfluoro (1-butenyl vinyl ether) polymer CYTOP. The CYTOP hydrophobic pattern is prepared by a semi-solidification photolithographic lift-off method. The perovskite precursor is then deposited on the CYTOP free area of the substrate surface. The morphology of the patterned perovskite pattern is characterized. Our results reveal that the perovskite pattern prepared by this method shows good crystallinity and sharp edge. For demonstration, arrays of diodes with a structure of ITO/perovskite/PCBM/BCP/Ag are fabricated.