Influence of Substrate Rotation on Crystal Structures and Magnetic Properties of CoMnP Films by Rotating-Cathode Electroplating

The technology of thick magnetic films deposition on curved surface has promising potential in the application of recording media to microelectromechanical systems (MEMS). This paper investigates CoMnP magnetic films by rotating-cathode electroplating and the optimization of electroplating parameters. The proposed rotating-cathode electroplating technique is capable to produce uniform thick CoMnP films with strong texture of Co HCP(002) and HCP(110) microstructures, showing superior results to traditional rack-plating.