Research of Mask Alignment Technology Based on Laser Direct Writing System

In the manufacturing of microwave and millimeter wave thin-film circuit, high accurate masks were manufactured by laser direct writing system (LDWS) and step & repeat printing system (SRPS) respectively. The alignment marks were studied in Cr mask and Ultra-grain glass mask. The lines of the marks were more straight and clear in Cr mask. It was easier to align between the Cr mask and the thin-film circuit. Vernier design was used to monitor the accuracy of Alignment. It is more convenient to identify the direction of Alignment. The calculation method of Alignment accuracy was provided. The Alignment process ability increased to ±1μm by Cr mask made by laser direct writing system.