Progression of the Multipole Resonance Probe: Advanced Plasma Sensors Based on LTCC-Technology

The multipole resonance probe (MRP) is a powerful and economical diagnostic tool for the determination of process-relevant plasma parameters. Due to its in-situ measurement concept even spatially resolved information of the plasma under investigation is provided. In order to minimize the influence of the sensor on the process, the planar multipole resonance probe (pMRP) was introduced as a minimally invasive monitoring tool, mounted into the reactor wall. For an effective application of these sensors in a wide field of real processes, industry compatible implementations are required. In this paper, advanced realizations of the MRP and pMRP based on LTCC-technology are presented, which are applicable for the supervision and control of plasma processes at high temperatures: the MRP
_LTCC
and the stacked pMRP
_LTCC
. The latter represents a novel compact design of the pMRP using an LTCC multilayer structure with vertically stacked components. Both sensors are investigated within 3D electromagnetic simulations and compared to measurements performed in a double inductively coupled plasma (DICP).