Synthesis of High-Quality AZO Polycrystalline Films via Target Bias Radio Frequency Magnetron Sputtering

Ceramic ZnO:Al (AZO) target bias of radio frequency (r.f.) sputtering system declines with time. The target bias voltage considerably influenced the resistivity and deposition rate of AZO films. This work only involved the regulation of target bias of r.f. magnetron sputtering system via a direct current (d.c.) bias power. Deposition rate and electrical properties of AZO films were increased through modulation bias voltage of target.