Fabrication of submicron structures on transparent quartz glasses with improved optical properties

This paper presents a method for the fabrication of submicron structures on transparent quartz glasses to improve optical properties. In this work, the submicron structures were fabricated by two-beam dual exposure laser interference lithography (LIL) and inductively coupled plasma-reactive ion etching (ICP-RIE). The reflectance of less than 5% and the transmittance of more than 95% were achieved in the visible and infrared range of light from 490nm to 1100nm. The experiment results have shown that this method is simple and efficient for the large-area fabrication of submicron structures on transparent quartz glasses with improved optical properties for many applications such as optical components and devices in optical engineering.