Array pattern synthesis by position shift method

A position shift method (PSM) is presented for uniform planar array pattern synthesis in this paper. This method minimizes the sidelobe level (SLL) by searching the best position solution for every sensor and calculating the pattern with position offset factor. The position offset factor will be calculated by the position shift value without changing the physical geometry. Numerical examples show that the proposed method has a lower SLL of -20.40dB for the 100 element planar array with the main beam width maintained, when compared with the other techniques published in the literature.