Invited impact of VCSEL scaling on speed and bit energy for high speed interconnects

The lithographic VCSELs are now being developed for high-speed applications. We present a number of features important to increase the VCSEL speed. Thermal properties and reliability for high operating current density are given, and the influence of device scaling. Modeling results are presented showing that oxide-free VCSELs can produce high intrinsic speed due to their ability to generate a greater stimulated emission rate.