Feasibility of Embedded DRAM Cells on FinFET Technology

In this paper, we analyze the suitability of implementing embedded DRAM (eDRAM) cells on FinFET technology compared to classical planar MOSFETs. The results show a significant improvement in overall cell performance for multi-gate devices. While pFinFET-based memories showed better cell behavior and variability robustness, mixed n/pFinFET cells had the highest working frequency and a negligible impact on degradation. Finally, we show that a multiple fin-height strategy can be used to reduce the layout area of the eDRAM cells (>10%).