Abstract:
We report local concentration of the Oersted field at the junction of electric contact geometry. The local Oersted field is numerically calculated with a simplified analy...Show MoreMetadata
Abstract:
We report local concentration of the Oersted field at the junction of electric contact geometry. The local Oersted field is numerically calculated with a simplified analytical model. This local field is then verified experimentally by observing magnetization reversal due to the current injection into Permalloy nanowires under magnetic field bias. The threshold current of magnetization reversal is found to be linearly dependent on the strength of the magnetic-field bias with a proportional coefficient (6.9 ± 0.2) × 10-11 Oe·m2/A, which provides evidence of the local concentration of the Oersted field at the junction.
Published in: IEEE Transactions on Magnetics ( Volume: 47, Issue: 10, October 2011)