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Semiconductor Manufacturing, IEEE Transactions on

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Semiconductor Manufacturing, IEEE Transactions on

Issue 1 • Date Feb. 2012

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Table of contents

IEEE Transactions on Semiconductor Manufacturing publication information

Editorial

Optimization of the Optical Whiteness Ratio for Flexible Display by Using Taguchi's Dynamic Approach

Transport Phenomena in a Novel Large MOCVD Reactor for Epitaxial Growth of GaN Thin Films

Analyzing UV/Vis/NIR Spectra-Sputtered ZnO:Al Thin-Films III: Plasma-Parameter Dep.

A Comparative Study of Metamodels for Fast and Accurate Simulation of Nano-CMOS Circuits

Adhesion of Contaminant Particles to Advanced Photomask Materials

GA Guided Cluster Based Fuzzy Decision Tree for Reactive Ion Etching Modeling: A Data Mining Approach

Estimating the Process Yield of Multiple Characteristics With One-Sided Specifications

Cost of Ownership/Yield Enhancement of High Volume Immersion Lithography Using Topcoat-Less Resists

Spatiotemporal Pattern Modeling for Fault Detection and Classification in Semiconductor Manufacturing

Fault Detection and Classification in Plasma Etch Equipment for Semiconductor Manufacturing $e$ -Diagnostics

Global and Local Virtual Metrology Models for a Plasma Etch Process

An Experimental Comparison of Production Planning Using Clearing Functions and Iterative Linear Programming-Simulation Algorithms

Discovering Correlated Parameters in Semiconductor Manufacturing Processes: A Data Mining Approach

Special issue on advanced modeling of power devicesand their applications

IEEE Transactions on Semiconductor Manufacturing information for authors

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