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Semiconductor Manufacturing, IEEE Transactions on

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Semiconductor Manufacturing, IEEE Transactions on

Issue 3 • Date Aug. 1993

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Comments, with reply, on "Dose perturbation by wafer charging during ion implantation" by Y. Sato et al

Trends and limits in monolithic integration by increasing the die area

Temperature distribution in semiconductor wafers heated in a vertical diffusion furnace

A novel laser direct write technique for fabrication of thin film MICs

Reactor characterization for a process to etch Si₃N₄ formed on thin SiO₂

Model identification in rapid thermal processing systems

An automated loading and unloading system for a maglev wafer transport path

PELOX integrated PBL

Particle removal from silicon wafer surface in wet cleaning process

Optimizing gettering conditions for VLSI chips using simple yield model

Advanced development process for ultrafine photoresist patterns

Model-based emissivity correction in pyrometer temperature control of rapid thermal processing systems

An improved methodology for real-time production decisions at batch-process work stations

ExPro-an expert system based process management system

Differentiation of source/drain breakdown mechanisms by a single ring transistor measurment

Integrating expert systems with a relational database in semiconductor manufacturing

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