Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Issue 1 • Date Jan 2011
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Displaying Results 1 - 25 of 96
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Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication
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PDF (2139 KB)
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Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage
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PDF (503 KB)
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Formation of silicon grass: Nanomasking by carbon clusters in cyclic deep reactive ion etching
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PDF (473 KB)
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Enhanced outcoupling of electroluminescence from
ZnS:ErF3 thin films by a photonic crystal |
PDF (665 KB)
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Deposit profiles characterized by the seed layer in Cu pulse-reverse plating on a patterned substrate
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PDF (329 KB)
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Nanoimprint replication of nonplanar nanostructure fabricated by focused-ion-beam chemical vapor deposition
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PDF (315 KB)
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Investigation of the radiation-induced thermal flexure of an x-ray lithography mask during a tilted exposure
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PDF (429 KB)
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Fabrication of flexible ultracapacitor/galvanic cell hybrids using advanced nanoparticle coating technology
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PDF (674 KB)
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Dual-sputtered process sensitivity of HfGdO charge-trapping layer in SONOS-type nonvolatile memory
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PDF (293 KB)
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Accuracy of thickness measurement for Ge epilayers grown on SiGe/Ge/Si(100) heterostructure by x-ray diffraction and reflectivity
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PDF (458 KB)
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Improvement of contact resistance between carbon nanotubes and metal electrodes for high performance electronics
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PDF (275 KB)
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High verticality InP/InGaAsP etching in
Cl2/H2/Ar inductively coupled plasma for photonic integrated circuits |
PDF (394 KB)
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Transparent semiconducting Nb-doped anatase
TiO2 films deposited by helicon-wave-excited-plasma sputtering |
PDF (531 KB)
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Residue growth on metallic hard mask after dielectric etching in fluorocarbon based plasmas. II. Solutions
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PDF (739 KB)
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Influence of
pH and abrasive concentration on polishing rate of amorphousGe2Sb2Te5 film in chemical mechanical polishing |
PDF (444 KB)
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Molecularly selective nanopatterns using nanoimprint lithography: A label-free sensor architecture
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PDF (500 KB)
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Aims & Scope
The Journal of Vacuum Science and Technology B is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
Gary E. McGuire
International Technology Center
