Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Issue 5 • Date Sep 2010
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Displaying Results 1 - 25 of 34
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Fabrication of antireflection-structured surface using vertical nanowires as an initial structure
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PDF (395 KB)
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Radioisotope-powered ion gauge with super high stability, long life, and large sensitivity range from ultrahigh vacuum to high pressure
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PDF (129 KB)
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Photoyield recovery of
Cs+NF3 activated negative electron affinity GaAs photoemitters without additional alkali deposition |
PDF (92 KB)
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InAlN/GaN heterostructure field-effect transistors on Fe-doped semi-insulating GaN substrates
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PDF (532 KB)
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Planarization of high aspect ratio
p-i-n diode pillar arrays for blanket electrical contacts |
PDF (339 KB)
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Micro- and nanopatterned polymethylmethacrylate layers on plastic poly(ethylene terephthalate) substrates by modified roller-reversal imprint process
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PDF (383 KB)
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Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing
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PDF (370 KB)
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High-resolution transmission-electron microscope characterization of onionlike carbon transformed from nanodiamond
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PDF (839 KB)
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Modeling of precursor coverage in ion-beam induced etching and verification with experiments using
XeF2 onSiO2 |
PDF (411 KB)
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Mechanistic study of ultralow
k -compatible carbon dioxide in situ photoresist ashing processes. I. Process performance and influence on ULK material modification |
PDF (736 KB)
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Mechanistic study of ultralow
k -compatible carbon dioxide in situ photoresist ashing processes. II. Interaction with preceding fluorocarbon plasma ultralowk etching processes |
PDF (751 KB)
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Degradation behavior of release layers for nanoimprint lithography formed on atomically flat Si(111) terraces
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PDF (637 KB)
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Line-width dependency on electromigration performance for long and short copper interconnects
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PDF (418 KB)
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Silicon on insulator nanoscale backside interconnects for atomic and molecular scale circuits
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PDF (1605 KB)
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Wafer-scale epitaxial graphene growth on the Si-face of hexagonal SiC (0001) for high frequency transistors
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PDF (762 KB)
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Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
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PDF (1137 KB)
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Enhanced electron-field emission from nanodiamond ridge-structured emission arrays capped on micropatterned silicon pillars
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PDF (302 KB)
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Modified postannealing of the Ge condensation process for better-strained Si material and devices
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PDF (803 KB)
Aims & Scope
The Journal of Vacuum Science and Technology B is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
Gary E. McGuire
International Technology Center
