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IBM Journal of Research and Development

Issue 6 • Nov. 1977

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Displaying Results 1 - 17 of 17
  • Automatic Registration in an Electron-Beam Lithographic System

    Publication Year: 1977, Page(s):498 - 505
    Cited by:  Papers (1)  |  Patents (8)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (525 KB)

    In the fabrication of integrated circuits, electron-beam systems are increasingly used to directly expose circuit patterns on resist-covered semiconductor wafers. These systems are made attractive by their inherent capability for writing patterns at high resolution, which eliminates the need for the masks used in optical exposure systems. To compete economically in production, electron-beam system... View full abstract»

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  • Correction of Nonlinear Deflection Distortion in a Direct Exposure Electron-Beam System

    Publication Year: 1977, Page(s):506 - 513
    Cited by:  Patents (10)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (468 KB)

    This paper describes a distortion correction technique, used in a high-throughput electron-beam exposure system, which achieves an absolute deflection accuracy of about 30 parts per million (ppm) throughout a 5-mm field. To accomplish this, a cyclic, numerically controlled magnetic deflection with an accuracy of about 1000 ppm and high repeatability is first established. Horizontal and vertical er... View full abstract»

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  • Electron Optics of an Electron-Beam Lithographic System

    Publication Year: 1977, Page(s):514 - 521
    Cited by:  Papers (1)  |  Patents (11)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (463 KB)

    This paper describes the electron optics of a practical scanning electron-beam lithographic system (EL1) that provides high-volume direct wafer exposure. The throughput limitation inherent in serial exposure is greatly reduced by exposing entire pattern segments with a shaped beam. The shaped-beam concept represents a combination of scanning and projection methods. Twenty-five image points are exp... View full abstract»

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  • Control of Magnetic Properties During the Processing of Single Crystal Garnet Films

    Publication Year: 1977, Page(s):522 - 527
    Cited by:  Papers (1)  |  Patents (3)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (384 KB)

    Thin single-crystal rare earth iron garnet films are currently the most attractive materials for magnetic bubble domain applications. To utilize their potential, tight control of the magnetic properties is needed at each of the film processing steps. Such steps include the growth of large-area films from a supersaturated PbO-B2 O3 fluxed melt, the phosphoric acid trimming of ... View full abstract»

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  • Permutation Clustering: An Approach to On-Line Storage Reorganization

    Publication Year: 1977, Page(s):528 - 533
    Cited by:  Patents (1)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (447 KB)

    A class of dynamic reorganization algorithms is described which embodies a number of desirable systems properties. Experiments on a trace taken from a large data base application indicate that a member of this class may be used to obtain time-varying or quasistatic organizations that exhibit improved paging performance. View full abstract»

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  • Functional Dependencies in a Relational Database and Propositional Logic

    Publication Year: 1977, Page(s):534 - 544
    Cited by:  Papers (11)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (580 KB)

    An equivalence is shown between functional dependency statements of a relational database, where “→” has the meaning of “determines,” and implicational statements of propositional logic, where “⇒” has the meaning of “implies.” Specifically, it is shown that a dependency statement is a consequence of a set of dependency statement... View full abstract»

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  • Sequential Stopping Rules for the Regenerative Method of Simulation

    Publication Year: 1977, Page(s):545 - 558
    Cited by:  Papers (8)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (708 KB)

    We consider the estimation via simulation of confidence intervals for steady-state response variables for stochastic systems which have a regenerative stochastic structure. Sequential stopping rules are investigated which allow the ratio of the width to the mid-point of an estimated confidence interval to be specified ahead of time. We prove that the resulting confidence intervals are valid asympt... View full abstract»

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  • Data Flow Analysis in the Presence of Procedure Calls

    Publication Year: 1977, Page(s):559 - 571
    Cited by:  Papers (3)  |  Patents (5)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (636 KB)

    The aliasing that results in a variable being known by more than one name has greatly complicated efforts to derive data flow information. The approach we take involves the use of a series of claims that, after we compute the data flow for some of the aliasing possibilities, allows us to produce good approximations for the remaining cases. The method can thus limit the potential combinatorial expl... View full abstract»

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  • Potential Significance to Neurophysiology of Design Algorithms for Digital Computers

    Publication Year: 1977, Page(s):572 - 575
    Cited by:  Patents (1)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (305 KB)

    A set of algorithms has been developed within the computer industry that aids in the design and comparison of large switching circuits. To apply these algorithms to the nervous system in a realistic way, it is necessary to find neurons where (a) the electrophysiological data exist to allow construction of a plausible model; and where (b) the behavior of the neuron is not dependent on its distant p... View full abstract»

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  • Effect of Substrate Bias on Properties of RF-Sputtered Cr–SiO Films

    Publication Year: 1977, Page(s):576 - 579
    Cited by:  Papers (1)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (340 KB)

    Properties of rf-sputtered Cr-SiO cermet films have been studied as a function of rf substrate bias. Films with five orders-of-magnitude change in electrical resistivity have been deposited from one Cr-SiO(50:50 wt%) target by changing the substrate bias. Resistivities of about 200 Ω · cm at 5% bias and about 2 × 10−3 Ω · cm at 20% bias have bee... View full abstract»

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  • Origin and Effects of Negative Ions in the Sputtering of Intermetallic Compounds

    Publication Year: 1977, Page(s):580 - 583
    Cited by:  Papers (1)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (351 KB)

    An unexpected etching phenomenon during the sputtering of rare earth-gold alloys has been found to be caused by a large flux of negative gold ions from the sputtering target. We find this effect to occur in a range of intermetallic compounds. A model is presented which predicts when negative ion formation will be important. Effects of negative ions on sputter deposition of thin films include reduc... View full abstract»

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  • Recent papers by IBM authors

    Publication Year: 1977, Page(s):584 - 589
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (382 KB)

    Reprints of the papers listed here may usally be obtained by writing directly to the authors. The authors' IBM divisions are identified as follows: DPD is the Data Processing Division; FED, Field Engineering Division; FSD, Federal Systems Division; GPD, General Products Division; GSD, General Systems Division; OPD, Office Products Division; RES, Research Division; SCD, System Communications Divisi... View full abstract»

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  • Recent IBM patents

    Publication Year: 1977, Page(s):590 - 591
    IEEE is not the copyright holder of this material | PDF file iconPDF (207 KB)
    Freely Available from IEEE
  • Authors

    Publication Year: 1977, Page(s):592 - 594
    IEEE is not the copyright holder of this material | PDF file iconPDF (232 KB)
    Freely Available from IEEE
  • Author Index for Papers in Volume 21

    Publication Year: 1977, Page(s):595 - 596
    IEEE is not the copyright holder of this material | PDF file iconPDF (308 KB)
    Freely Available from IEEE
  • Subject Index for Papers in Volume 21

    Publication Year: 1977, Page(s):597 - 598
    IEEE is not the copyright holder of this material | PDF file iconPDF (221 KB)
    Freely Available from IEEE
  • Errata [Erratum]

    Publication Year: 1977, Page(s): 598
    IEEE is not the copyright holder of this material | PDF file iconPDF (213 KB)
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