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IBM Journal of Research and Development

Issue 4 • Date July 1980

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Displaying Results 1 - 12 of 12
  • Computer Simulation of Electron-Beam Resist Profiles

    Publication Year: 1980, Page(s):426 - 437
    Cited by:  Papers (3)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (940 KB)

    A user-oriented, conversational computer program, LMS (Lithography Modeling System), has been developed for rapid investigation of the total lithographic process used in electron-beam lithography, including electron exposure and resist development. Electron scattering and energy deposition within the resist film are simulated with Monte Carlo techniques, including the significant effects of electr... View full abstract»

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  • Proximity Effects in Electron Lithography: Magnitude and Correction Techniques

    Publication Year: 1980, Page(s):438 - 451
    Cited by:  Papers (5)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (1143 KB)

    Proximity effects due to electron scattering in the resist and substrate seem to set a fundamental limit to the areal density that can be achieved in electron lithography. This work briefly reviews the form and the magnitude of the proximity function and its extent as evidenced by deviations in designed linewidths. It also discusses methods to decrease the proximity effect as well as the algorithm... View full abstract»

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  • Single-Step Optical Lift-Off Process

    Publication Year: 1980, Page(s):452 - 460
    Cited by:  Papers (49)  |  Patents (12)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (854 KB)

    A process is described that allows the use of the lift-off metallization technique with ultraviolet exposure of a single layer of ®AZ-type photoresist. The process consists of soaking the resist layer for a predetermined time either in chlorobenzene or other aromatic solvents such as toluene and benzene before or after exposure. After development, resist profiles with overhangs suitable for... View full abstract»

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  • Overlay in Lithography

    Publication Year: 1980, Page(s):461 - 468
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (611 KB)

    Advances in lithography rely largely on the capability of reducing overlay errors, which in turn depends on the capability to make two-dimensional overlay measurements. This paper describes a simple and accurate method of determining singular overlay errors of step-and-repeat exposure systems with a precision of ±0.01 µm (standard deviation). View full abstract»

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  • Defect-Related Breakdown and Conduction in SiO2

    Publication Year: 1980, Page(s):469 - 479
    Cited by:  Papers (3)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (736 KB)

    A statistical model incorporating the effects of defects provides a good representation of breakdown results for Al-SiO2-Si MOS capacitors. Implications of this model for interpretation of the yield from life tests and histograms obtained from ramp tests are discussed for the case of a Poisson distribution of defects over the capacitors. The breakdown rates of MOS capacitors in life tes... View full abstract»

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  • Stand-Alone Wiring Program for Josephson Logic

    Publication Year: 1980, Page(s):480 - 485
    Cited by:  Papers (3)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (488 KB)

    This paper describes a channel routing wiring program and its interface to the user. Of particular interest are its interface facilities, which permit manual update of the routing, pre-routing, and incremental routing. A hierarchical organization of the logic is feasible, which permits moving of complex entities, such as latches, adders and others, as complete entities. The internal wiring of thes... View full abstract»

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  • Existence of Good δ-Decodable Codes for the Two-User Multiple-Access Adder Channel

    Publication Year: 1980, Page(s):486 - 495
    Cited by:  Papers (2)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (647 KB)

    This paper defines a class of δ-decodable codes for the two-user multiple-access adder channel with binary inputs. This class is a generalization of the class of two-user codes investigated by Kasami and Lin (1978). Lower bounds on the achievable rates of codes in this class are derived. We show that, for a wide range of error correcting capability, this class contains good two-user δ... View full abstract»

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  • Optimal Accelerometer Layouts for Data Recovery in Signature Verification

    Publication Year: 1980, Page(s):496 - 511
    Cited by:  Papers (8)  |  Patents (1)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (1140 KB)

    Current experimental use of pen acceleration data for signature verification has prompted the mathematical theory of our recent paper on the subject, expounding motion recovery techniques for a special pen with imbedded accelerometers. This continuation seeks to optimize the instrument layout as a mechanical filter which serves to extract the kinematic observables from the experimental noise. Our ... View full abstract»

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  • Procedures for the Study of the Flexible-Disk to Head Interface

    Publication Year: 1980, Page(s):512 - 517
    Cited by:  Papers (4)  |  Patents (2)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (475 KB)

    The response of a rotating flexible disk interacting with a read-write head is analyzed. The disk deflection due to an arbitrary distributed normal pressure is coupled with the Reynolds lubrication equation for the disk-to-head air bearing. Procedures which considerably reduce the computation time necessary for obtaining a converged solution are described. A parameter study is then discussed and i... View full abstract»

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  • Recent Papers by IBM Authors

    Publication Year: 1980, Page(s):518 - 523
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (544 KB)

    Reprints of the papers listed here may usually be obtained by writing directly to the authors. The authors' IBM divisions are identified as follows: CHQ is Corporate Headquarters; DPD, Data Processing Division; DSD, Data Systems Division; FED, Field Engineering Division; FSD, Federal Systems Division; GPD, General Products Division; GSD, General Systems Division; OPD, Office Products Division; RES... View full abstract»

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  • Recent IBM Patents

    Publication Year: 1980, Page(s):524 - 525
    IEEE is not the copyright holder of this material | PDF file iconPDF (211 KB)
    Freely Available from IEEE
  • Authors

    Publication Year: 1980, Page(s):526 - 528
    IEEE is not the copyright holder of this material | PDF file iconPDF (295 KB)
    Freely Available from IEEE

Aims & Scope

The IBM Journal of Research and Development is a peer-reviewed technical journal, published bimonthly, which features the work of authors in the science, technology and engineering of information systems.

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Editor-in-Chief
Clifford A. Pickover
IBM T. J. Watson Research Center