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IBM Journal of Research and Development

Issue 6 • Date Nov. 1987

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Displaying Results 1 - 12 of 12
  • Contact metallurgy development for VLSI logic

    Publication Year: 1987, Page(s):608 - 616
    Cited by:  Papers (4)  |  Patents (2)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (757 KB)

    The criteria involved with the choice of an ohmic contact material for VLSI logic are discussed. The problems of aluminum penetration encountered with Al metallization and solid-phase epitaxy associated with Al-Si metallization make these interconnect materials incompatible with VLSI technology. The contact resistance characteristics of palladium and platinum silicides were compared to the contact... View full abstract»

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  • Electrical and microstructural investigation of polysilicon emitter contacts for high-performance bipolar VLSI

    Publication Year: 1987, Page(s):617 - 626
    Cited by:  Papers (3)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (948 KB)

    Key electrical characteristics of polysilicon emitter contacts in bipolar transistors, such as contact resistance and recombination velocity, are extremely sensitive to the microstructure of the polysilicon/single-crystal silicon interface. In this study, we correlated the microstructural and electrical characteristics of this interface by performing cross-sectional transmission electron microscop... View full abstract»

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  • Study of contact and shallow junction characteristics in submicron CMOS with self-aligned titanium silicide

    Publication Year: 1987, Page(s):627 - 633
    Cited by:  Patents (1)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (568 KB)

    The contact resistance between TiSi2 and shallow n+/p+ source-drains in CMOS is studied for a variety of junction depths and silicide thicknesses. The contact contribution to the total device series resistance can be significant if excessive silicon and dopants are consumed during silicide formation. Low contact resistances are obtained for 0.15-µm n... View full abstract»

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  • Oxidation of Si-rich chemical-vapor-deposited films of tungsten silicide

    Publication Year: 1987, Page(s):634 - 640
    Cited by:  Patents (2)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (687 KB)

    We have studied dry oxidation characteristics of Si-rich WSix thin films prepared by LPCVD directly on SiO2, with x = 2.7 for as-deposited films. It has been reported previously that thin (less than 100 nm) CVD tungsten silicide adheres well to SiO2. Using Auger depth profiling and Rutherford backscattering spectroscopies, we find that silicon in excess of stoichio... View full abstract»

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  • Correlation analysis of particle clusters on integrated circuit wafers

    Publication Year: 1987, Page(s):641 - 650
    Cited by:  Papers (33)  |  Patents (3)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (770 KB)

    Defect clustering results in correlations between the numbers of defects or faults that occur on integrated circuit chips located adjacent to one another on semiconductor wafers. Until now, it has been believed that correlations of this type were not accounted for in existing yield models. It is shown in this paper that such correlations are present in yield models based on mixed or compound Poiss... View full abstract»

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  • Modeling and analysis of computer system availability

    Publication Year: 1987, Page(s):651 - 664
    Cited by:  Papers (32)  |  Patents (1)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (1123 KB)

    The quantitative evaluation of computer-system availability is becoming increasingly important in the design and configuration of commercial computer systems. This paper deals with methods for constructing and solving large Markov-chain models of computer-system availability. A set of powerful high-level modeling constructs is discussed that can be used to represent the failure and repair behavior... View full abstract»

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  • Ferroresonance

    Publication Year: 1987, Page(s):665 - 678
    Cited by:  Papers (1)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (930 KB)

    This paper describes a mathematical model for ferroresonant circuits that addresses some of the deficiencies of earlier analyses of ferroresonant regulators. Derived using piecewise-linear, normalized differential equations, the model accommodates nonlinear behavior and predicts circuit performance in terms of parameters such as line voltage, frequency, and load. A phase-plane analysis is used to ... View full abstract»

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  • Font design for high-speed impact line printers

    Publication Year: 1987, Page(s):679 - 684
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (475 KB)

    In impact line printers that use print-band (or similar) technology, the higher speed required of the type band for higher print throughput results in wider printed strokes with increased slur. Ordinarily, font designers compensate for the increased printed strokewidth by narrowing the width of the engraved characters on the type band. While this approach corrects the total printed character strok... View full abstract»

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  • Recent publications by IBM authors

    Publication Year: 1987, Page(s):685 - 691
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (572 KB)

    The informationl isted here is supplied by the Institute for Scientific Informarion and orher outside sources. Reprints ofthe papers may be obtained by writing directly to the first author cited. Information on books may be obtained by writing the publisher. Papers and books are listed alphabetically by author. View full abstract»

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  • Recent IBM patents

    Publication Year: 1987, Page(s):692 - 693
    IEEE is not the copyright holder of this material | PDF file iconPDF (175 KB)
    Freely Available from IEEE
  • Author index for Volume 31

    Publication Year: 1987, Page(s):694 - 696
    IEEE is not the copyright holder of this material | PDF file iconPDF (193 KB)
    Freely Available from IEEE
  • Subject index for Volume 31

    Publication Year: 1987, Page(s):697 - 700
    IEEE is not the copyright holder of this material | PDF file iconPDF (280 KB)
    Freely Available from IEEE

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The IBM Journal of Research and Development is a peer-reviewed technical journal, published bimonthly, which features the work of authors in the science, technology and engineering of information systems.

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Editor-in-Chief
Clifford A. Pickover
IBM T. J. Watson Research Center