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IBM Journal of Research and Development

Issue 2 • March 1992

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Displaying Results 1 - 8 of 8
  • Preface

    Publication Year: 1992, Page(s):138 - 139
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (162 KB)

    A remarkable aspect of the microelectronics industry is how quickly it has evolved. The number of on-chip components of silicon integrated circuits has been following the well-known trend of doubling every two years since the early 1960s. This trend is expected to continue, though at a somewhat slower pace due to increased technology complexity and manufacturing cost. The major driving force behin... View full abstract»

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  • Plasma-based dry etching techniques in the silicon integrated circuit technology

    Publication Year: 1992, Page(s):140 - 157
    Cited by:  Papers (3)  |  Patents (1)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (1487 KB)

    Plasma-based dry etching techniques play a major role in the formation of silicon-based integrated circuits. The first part of this paper reviews our understanding of the means for achieving etching directionality and selectivity in reactive etching using glow discharges. Relevant trends in magnetically enhanced rf diode systems, microwave-excited electron cyclotron resonance plasmas, process clus... View full abstract»

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  • Stress-induced dislocations in silicon integrated circuits

    Publication Year: 1992, Page(s):158 - 182
    Cited by:  Papers (19)  |  Patents (8)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (2308 KB)

    Many of the processes used in the fabrication of silicon integrated circuits lead to the development of stress in the silicon substrate. Given enough stress, the substrate will yield by generating dislocations. We examine the formation of stress-induced dislocations in integrated circuit structures. Examples are presented from bipolar and MOS-based integrated circuit structures that were created d... View full abstract»

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  • Application of electron and ion beam analysis techniques to microelectronics

    Publication Year: 1992, Page(s):183 - 207
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (2458 KB)

    The application of electron microscopy, scanning tunneling microscopy, and medium-energy ion scattering to microelectronics is reviewed. These analysis techniques are playing an important role in advancing the technology. Their use in the study of relevant phenomena regarding surfaces, interfaces, and defects is discussed. Recent developments and applications are illustrated using results obtained... View full abstract»

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  • Numerical modeling of advanced semiconductor devices

    Publication Year: 1992, Page(s):208 - 232
    Cited by:  Papers (6)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (2225 KB)

    Numerical modeling of the electrical behavior of semiconductor devices is playing an increasingly important role in their development. Examples that pertain to advanced MOSFETs and bipolar transistors are presented to illustrate the importance of taking into account three-dimensional as well as nonequilibrium and nonlocal physical phenomena to effectively characterize the electrical behavior of su... View full abstract»

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  • Integrated processing for microelectronics science and technology

    Publication Year: 1992, Page(s):233 - 276
    Cited by:  Papers (3)  |  Patents (2)
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (3932 KB)

    This paper is a review of integrated processing-an approach to microelectronics fabrication in which sequential processes are linked by wafer transfer through a clean, controlled environment (e.g., high vacuum or inert gas). The approach is rapidly becoming the state of the art in microelectronics research, development, and manufacturing. In microelectronics research, it provides a means for advan... View full abstract»

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  • Recent publications by IBM authors

    Publication Year: 1992, Page(s):277 - 319
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (3780 KB)

    The information listed here is supplied by the Institute for Scientific Information and other outside sources. Reprints of the papers may be obtained by writing directly to the first author cited. Information on books may be obtained by writing to the publisher. View full abstract»

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  • Recent IBM patents

    Publication Year: 1992, Page(s):321 - 325
    IEEE is not the copyright holder of this material | PDF file iconPDF (329 KB)
    Freely Available from IEEE

Aims & Scope

The IBM Journal of Research and Development is a peer-reviewed technical journal, published bimonthly, which features the work of authors in the science, technology and engineering of information systems.

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Editor-in-Chief
Clifford A. Pickover
IBM T. J. Watson Research Center