Early Access Articles
Early Access articles are new content made available in advance of the final electronic or print versions and result from IEEE's Preprint or Rapid Post processes. Preprint articles are peer-reviewed but not fully edited. Rapid Post articles are peer-reviewed and edited but not paginated. Both these types of Early Access articles are fully citable from the moment they appear in IEEE Xplore.Filter Results
-
-
-
Fast and Accurate Characterization of MOS and Interconnect Capacitance Using Direct Charge Measurement (DCM)
|
PDF (1418 KB)
-
Semiconductor Materials Optimization for A TFET Device with a CentralNothing Region On Insulator
|
PDF (1163 KB)
-
-
-
Improving equipment defectivity specifications through chip yield modeling: a case study for immersion lithography
|
PDF (247 KB)
-
-
-
A Test Circuit for Extremely Low Gate Leakage Current Measurement of 10 aA for 80,000 MOSFETs in 80 s
|
PDF (738 KB)
-
-
-
Machine Vision-Based Defect Detection in IC Images Using the Partial Information Correlation Coefficient
|
PDF (1551 KB)
-
Multiparametric Virtual Metrology Model Building by Job-shop Data Fusion Using a Markov Chain Monte Carlo Method
|
PDF (1601 KB)
-
-
Aims & Scope
IEEE Transactions on Semiconductor Manufacturing addresses innovations of interest to the integrated circuit manufacturing researcher and professional.
Meet Our Editors
Editor-in-Chief
Dr. Sean P. Cunningham
Intel Corporation
RN4-80
2200 Mission College Boulevard
Santa Clara, CA 95054 95054 USA
sean.p.cunningham@intel.com
Phone:+1 408-653-5955


