Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Issue 1 • Date Jan 2002
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Displaying Results 1 - 25 of 93
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Issue Cover
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PDF (6 KB)
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Issue Table of Contents
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Characterization of annealing effects of low temperature chemical vapor deposition oxide films as application of 4H-SiC metal–oxide–semiconductor devices
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PDF (85 KB)
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Electron optics using multipole lenses for a low energy electron beam direct writing system
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PDF (574 KB)
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Fabrication of c-axis oriented ZnO/AlN thin films prepared by radio frequency reactive sputtering and development of ZnO/AlN layered structure surface acoustic wave devices
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PDF (65 KB)
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Characterization of self-assembled alkanethiol monolayers using a low-current scanning tunneling microscope
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PDF (993 KB)
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Potential distribution and field intensity for a hyperboloidal probe in a uniform field
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PDF (200 KB)
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Ion beam proximity lithography on spherical substrates with continuously scanned, self-complementary masks
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PDF (370 KB)
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Nondestructive via in-hole profile characterization using atomic force microscopy metrology
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PDF (1366 KB)
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Investigation of macroscopic uniformity during
CH4/H2 reactive ion etching of InP and its improvement by use of a guard ring |
PDF (338 KB)
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Properties of porous HSQ-based films capped by plasma enhanced chemical vapor deposition dielectric layers
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PDF (818 KB)
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Characterization of plasma-enhanced chemical vapor deposition carbon nanotubes by Auger electron spectroscopy
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PDF (603 KB)
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Field electron emission from carbon nanotubes grown by plasma-enhanced chemical vapor deposition
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PDF (261 KB)
Aims & Scope
The Journal of Vacuum Science and Technology B is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
Gary E. McGuire
International Technology Center
