Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Issue 2 • Date Mar 1992
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Displaying Results 1 - 25 of 116
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Issue Table of Contents
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PDF (805 KB)
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Investigation by scanning tunneling microscopy of the effect of preparative variables on the degree of aggregation of platinum on highly oriented pyrolytic graphite
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PDF (1046 KB)
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Scanning tunneling characterization of the atomic and electronic structure of nanometer thick carbon films grown by pulsed laser vaporization of graphite
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PDF (1985 KB)
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Focused ion beam micromachining for transmission electron microscopy specimen preparation of semiconductor laser diodes
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PDF (928 KB)
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Analysis of the mean crystallite size and microstress in titanium silicide thin films
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PDF (618 KB)
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Quality dependence of Pt–n‐GaAs Schottky diodes on the defects introduced during electron beam deposition of Pt
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PDF (959 KB)
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Residue formation and elimination in chlorine‐based plasma etching of Al–Si–Cu interconnections
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PDF (882 KB)
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Low pressure chemical vapor deposition of silicon dioxide below 500 °C by the pyrolysis of diethylsilane in oxygen
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PDF (1476 KB)
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Properties of borophosphosilicate glass films deposited by different chemical vapor deposition techniques
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PDF (1996 KB)
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Molecular dynamics simulations of deep penetration by channeled ions during low‐energy ion bombardment of III–V semiconductors
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PDF (1525 KB)
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Silylation of novolac based resists: Influence of deep‐ultraviolet induced crosslinking
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PDF (2606 KB)
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Quantitative description of dissolution and dissolution inhibition in novolak and other phenolic resins
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PDF (942 KB)
Aims & Scope
The Journal of Vacuum Science and Technology B is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
Gary E. McGuire
International Technology Center
