Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Issue 6 • Date Nov 1996
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Displaying Results 1 - 25 of 50
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Issue Table of Contents
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PDF (35 KB)
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Current capabilities and limitations of in situ particle monitors in silicon processing equipment
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PDF (151 KB)
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Effect of supplied substrate bias frequency in ultrahigh‐frequency plasma discharge for precise etching processes
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PDF (259 KB)
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Etching characteristics of tin oxide thin films in argon–chlorine radio frequency plasmas
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PDF (367 KB)
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Integrated processing of silicon oxynitride films by combined plasma and rapid‐thermal processing
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PDF (173 KB)
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Ion–surface interactions in low temperature silicon epitaxy by remote plasma enhanced chemical–vapor deposition
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PDF (160 KB)
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Generation of an electron cyclotron resonance plasma using coaxial‐type open‐ended dielectric cavity with permanent magnets
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PDF (99 KB)
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Pulse–time‐modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge‐free etching
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PDF (255 KB)
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Electric field control of plasma and macroparticles in cathodic arc deposition as a practical alternative to magnetic fields in ducts
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PDF (231 KB)
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Measurements of spatial and temporal sheath evolution inside tubular material for inner surface ion implantation
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PDF (96 KB)
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Sputtering of metallic walls in Ar/H
2 direct current glow discharges at room temperature |
PDF (104 KB)
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Effect of nonstoichiometry upon optical properties of radio frequency sputtered Al–N thin films formed at various sputtering pressures
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PDF (166 KB)
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Low‐temperature deposition of cubic BN:C films by unbalanced direct current magnetron sputtering of a B
4 C target |
PDF (203 KB)
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Monte Carlo numerical analysis of target erosion and film growth in a three‐dimensional sputtering chamber
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PDF (404 KB)
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Formation of titanium nitride coatings by nitrogen plasma immersion ion implantation of evaporated titanium films
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PDF (67 KB)
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Optical emission spectroscopy from arc‐like Ti vapor plasma and effects of self‐ion bombardment on Ti and TiN film deposition
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PDF (256 KB)
Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University
