Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Issue 5 • Date Sep 1996
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Displaying Results 1 - 25 of 46
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Issue Table of Contents
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PDF (29 KB)
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X‐ray photoelectron spectroscopy characterization of radio frequency reactively sputtered carbon nitride thin films
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PDF (88 KB)
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Reactive magnetron sputter deposited CN
x : Effects of N2 pressure and growth temperature on film composition, bonding, and microstructure |
PDF (236 KB)
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Effect of gas composition and bias voltage on the structure and properties of a‐C:H/SiO
2 nanocomposite thin films prepared by plasma‐enhanced chemical‐vapor deposition |
PDF (129 KB)
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Influence of O+
2 energy, flux, and fluence on the formation and growth of sputtering‐induced ripple topography on silicon |
PDF (846 KB)
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A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources
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PDF (178 KB)
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Influence of adding transition metal elements to an aluminum target on electrical resistivity and hillock resistance in sputter‐deposited aluminum alloy thin films
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PDF (773 KB)
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Surface topography development on ion‐beam‐sputtered surfaces: Role of surface inhomogeneity induced by ion‐beam bombardment
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PDF (1860 KB)
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Si/XeF
2 etching: Temperature dependence |
PDF (196 KB)
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Plasma deposition of low‐stress electret films for electroacoustic and solar cell applications
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PDF (108 KB)
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Metal ion production by ion bombardment
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PDF (229 KB)
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Chemical dry etching of silicon nitride and silicon dioxide using CF
4 /O2 /N2 gas mixtures |
PDF (196 KB)
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Mechanism of selective SiO
2 /Si etching with fluorocarbon gases (CF4 , C4 F8 ) and hydrogen mixture in electron cyclotron resonance plasma etching system |
PDF (167 KB)
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Correlation between gas phase composition of rf plasma of argon diluted tetraethylgermanium and chemical structure of therewith deposited Ge/C films
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PDF (149 KB)
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Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. II. Preparation and characterization of Al
x Tiy Oz thin films |
PDF (193 KB)
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Preparation of polysiloxane thin films using CO
2 laser evaporation assisted by remote radical source |
PDF (157 KB)
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Model for a large area multi‐frequency multiplanar coil inductively coupled plasma source
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PDF (389 KB)
Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University
