Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Issue 5 • Date Sep 1995
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Displaying Results 1 - 25 of 53
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Molecular beam epitaxy of GaN(0001) utilizing NH
3 and/or NH+x ions: Growth kinetics and defect structure
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PDF (1317 KB)
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Preparation and properties of Ti(Y)N coatings
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PDF (520 KB)
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Comprehensive interpretation of the preferred orientation of vapor‐phase grown polycrystalline silicon films
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PDF (277 KB)
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Effect of substrate temperature on the deposition of polytetrafluoroethylene by an ionization‐assisted evaporation method
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PDF (560 KB)
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Real‐time monitoring of the deposition and growth of thin organic films by in situ ellipsometry
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PDF (399 KB)
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Investigation of SiO
2 plasma enhanced chemical vapor deposition through tetraethoxysilane using attenuated total reflection Fourier transform infrared spectroscopy |
PDF (478 KB)
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Reflectance anisotropy spectroscopy: A probe for surface chemistry on Na
2 S‐passivated and (NH4 )2 S‐passivated (001) GaAs |
PDF (204 KB)
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Study of the optical constants determination of thin films: Dependence on theoretical assumptions
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PDF (245 KB)
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Quantitative determination of titanium nitride films by high energy resolution Auger electron spectroscopy
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PDF (180 KB)
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Thermal annealing of the epitaxial Al/Si(111)7×7 interface: Al clustering, interfacial reaction, and Al‐induced p+ doping
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PDF (588 KB)
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Electric states of segregated metal atom on metal surfaces and potential use for field emitter
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PDF (101 KB)
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Pressure effect on YBa
2 Cu3 O7 thin film growth in off‐axis radio frequency magnetron sputtering |
PDF (876 KB)
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Oxide film deposition by radio frequency sputtering with electron cyclotron resonance plasma stimulation
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PDF (244 KB)
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Angular distribution of sputtered neutrals in a post magnetron geometry: Measurement and Monte Carlo simulation
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PDF (294 KB)
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Synchrotron‐radiation‐excited etching and total electron yield measurement of silicon and silicon nitride
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PDF (365 KB)
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Simulations of real‐time control of two‐dimensional features in inductively coupled plasma sources for etching applications
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PDF (247 KB)
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Characterization at different aspect ratios (radius/length) of a radio frequency inductively coupled plasma source
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PDF (156 KB)
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Evaluation of the background signal for mass spectrometry under high ambient hydrogen pressures in plasma discharges
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PDF (206 KB)
Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University
