Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Issue 3 • Date May 1995
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Displaying Results 1 - 25 of 242
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Optical method for low pressure measurements
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PDF (153 KB)
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Enhancement of hydrogen pumping by injecting fluorine into the exhaust system of turbomolecular pumps
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PDF (185 KB)
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Vacuum characteristics of titanium
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PDF (136 KB)
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Secondary ion mass spectroscopy analysis for aluminum surfaces treated by glow discharge cleaning
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PDF (181 KB)
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X‐ray photoelectron spectroscopy analysis of cleaning procedures for synchrotron radiation beamline materials at the Advanced Photon Source
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PDF (117 KB)
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Photon stimulated desorption measurements of extruded copper and of welded copper beam chambers for the PEP‐II asymmetric B factory
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PDF (105 KB)
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Chemical vapor deposited TiCN: A new barrier metallization for submicron via and contact applications
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PDF (453 KB)
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Plasma enhanced chemical vapor deposition of TiO
2 in microwave‐radio frequency hybrid plasma reactor |
PDF (164 KB)
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Interface characterization of an InP/InGaAs resonant tunneling diode by scanning tunneling microscopy
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PDF (542 KB)
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Fourier transform infrared study of rapid thermal annealing of a‐Si:N:H(D) films prepared by remote plasma‐enhanced chemical vapor deposition
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PDF (179 KB)
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Electrical transport properties of hot electrons at metal, insulator, and semiconductor interfaces
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PDF (237 KB)
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Epitaxial growth of a metal(CoSi
2 )/insulator(CaF2 ) nanometer‐thick heterostructure and its application to quantum‐effect devices |
PDF (145 KB)
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Optical waveguides on silicon chips
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PDF (1781 KB)
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Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University
